Recent Progresses in Direct Photolithographic Patterning of Quantum DotsClick to copy article linkArticle link copied!
- Yifei LiuYifei LiuFujian Engineering Research Center for Solid-State Lighting, Department of Electronic Science, School of Electronic Science and Engineering, Xiamen University, Xiamen, Fujian 361005, ChinaMore by Yifei Liu
- Jiayuan LiJiayuan LiFujian Engineering Research Center for Solid-State Lighting, Department of Electronic Science, School of Electronic Science and Engineering, Xiamen University, Xiamen, Fujian 361005, ChinaMore by Jiayuan Li
- Siting CaiSiting CaiFujian Engineering Research Center for Solid-State Lighting, Department of Electronic Science, School of Electronic Science and Engineering, Xiamen University, Xiamen, Fujian 361005, ChinaMore by Siting Cai
- Tingzhu WuTingzhu WuFujian Engineering Research Center for Solid-State Lighting, Department of Electronic Science, School of Electronic Science and Engineering, Xiamen University, Xiamen, Fujian 361005, ChinaInnovation Laboratory for Sciences and Technologies of Energy Materials of Fujian Province (IKKEM), Xiamen, Fujian 361102, ChinaMore by Tingzhu Wu
- Zhong ChenZhong ChenFujian Engineering Research Center for Solid-State Lighting, Department of Electronic Science, School of Electronic Science and Engineering, Xiamen University, Xiamen, Fujian 361005, ChinaInnovation Laboratory for Sciences and Technologies of Energy Materials of Fujian Province (IKKEM), Xiamen, Fujian 361102, ChinaMore by Zhong Chen
- Yue Lin*Yue Lin*Email: [email protected]Fujian Engineering Research Center for Solid-State Lighting, Department of Electronic Science, School of Electronic Science and Engineering, Xiamen University, Xiamen, Fujian 361005, ChinaInnovation Laboratory for Sciences and Technologies of Energy Materials of Fujian Province (IKKEM), Xiamen, Fujian 361102, ChinaMore by Yue Lin
- Shuli Wang*Shuli Wang*Email: [email protected]Fujian Engineering Research Center for Solid-State Lighting, Department of Electronic Science, School of Electronic Science and Engineering, Xiamen University, Xiamen, Fujian 361005, ChinaMore by Shuli Wang
Abstract

Luminous quantum dots (QDs) are highly attractive materials for advanced display technologies due to their exceptional optical properties, including strong absorption, narrow emission spectra, and high photoluminescence quantum yields. These characteristics enable their use in next-generation microdisplays requiring high brightness, superior color purity, broad color gamut, and fast response times. Among various fabrication techniques, direct photolithographic patterning of QDs stands out as a highly reliable method for creating QD pixel arrays. This approach offers significant advantages in terms of resolution, throughput, response time, scalability, and seamless integration with conventional micro/nanofabrication processes. This review critically examines recent progress in direct photolithographic patterning of QDs for microdisplay applications. We particularly focus on the underlying light-responsive mechanisms of QD surface ligand engineering and the development of QD–polymer composites. Furthermore, we evaluate the performance of the resulting patterned QD microstructures in actual microdisplay applications. Finally, we address the current challenges in practical implementation and propose future directions for the advancement of QD direct lithographic patterning techniques, with the aim of providing valuable insights for continued innovation in this rapidly evolving field.
Cited By
This article is cited by 2 publications.
- Kuibao Yu, Yanbing Liu, Zhihan Lin, Yongshen Yu, Fushan Li, Hailong Hu. Self-Assembled Monolayer InP Quantum Dots for Direct Photolithographic High-Resolution Light-Emitting Devices. ACS Applied Materials & Interfaces 2026, 18
(1)
, 2324-2331. https://doi.org/10.1021/acsami.5c22872
- Bo Tan, Maoyuan Huang, Haiyang Li, Rui Jiang, Jie Zhao, Binkun Xie, Jun Wang, Shiliang Mei, Wanlu Zhang, Pengfei Tian, Ruiqian Guo. Photocrosslinkers with dual-functional crosslinking mechanisms for direct photolithographic patterning of quantum dots. Journal of Colloid and Interface Science 2026, 709 , 139938. https://doi.org/10.1016/j.jcis.2026.139938
Article Views are the COUNTER-compliant sum of full text article downloads since November 2008 (both PDF and HTML) across all institutions and individuals. These metrics are regularly updated to reflect usage leading up to the last few days.
Citations are the number of other articles citing this article, calculated by Crossref and updated daily. Find more information about Crossref citation counts.
The Altmetric Attention Score is a quantitative measure of the attention that a research article has received online. Clicking on the donut icon will load a page at altmetric.com with additional details about the score and the social media presence for the given article. Find more information on the Altmetric Attention Score and how the score is calculated.


